Title of article :
Effect of constituent halogens upon the thermal alkali
ion production from alkali halides on tungsten
Author/Authors :
H. Kawano*، نويسنده , , K. Ohgami، نويسنده , , S. Matsui، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Abstract :
To clarify the effect of halogen (X) upon the production of ion (M) from alkali halide (MX) on a tungsten surface heated in
vacuum, the ionization ef®ciency (b) of MX was measured as a function of surface temperature (T), and the effective work
function (f) of the surface was determined, thus yielding the conclusions: (1) above 1950 K, the surface was kept virtually
clean at f 5:2 eV; (2) as T decreased from 1950 to 1400 K, b and f were increased to unity and above 6 eV,
respectively, mainly by adsorption of neither MX nor X but of residual gases (RG) and (3) below 1300 K, each of b and f
showed different patterns among MXʹs because of coadsorption of MX and RG. The work function (fe) for thermal electron
emission exhibited the same temperature dependence as that of f and f ÿ fe was constant at 0.7 eV above 1600 K,
supporting the above conclusions. # 2001 Elsevier Science B.V. All rights reserved.
Keywords :
Effective work function , Residual gas adsorption , Alkali halide beam incidence , Polycrystallinetungsten surface , Thermal positive ion emission
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science