Title of article :
Laser-assisted metal deposition from liquid-phase precursors on polymers
Author/Authors :
K. KordaAs، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
12
From page :
178
To page :
189
Abstract :
In this work, a short review is presented for results utilizing the technique of laser-assisted metallization of dielectrics. Experimental efforts and results related to the metal (palladium (Pd), copper (Cu) and silver (Ag)) deposition on polymeric materials (polyimide (PI), mylar) are reported. These polymers and metals are chosen due to their growing importance in the rapidly-developing microelectronics packaging industry. The method of laser-induced chemical liquid-phase deposition (LCLD) offers many advantages compared to other techniques such as laser-induced forward transfer (LIFT), pulsed-laser deposition (PLD) and laser-assisted chemical vapor-phase deposition (LCVD). The LCLD is time and cost effective because vacuum tools and special pre-treatments are not required. The consumed chemicals used in precursors are non-harmful and easy to handle due to the liquid phase. For the optimal physical and chemical properties of deposits, the laser and solution parameters are varied. XeCl and KrF excimer and Ar‡ lasers are employed for executing the palladium, Ag and/or Cu formation on the polymer substrates. Chemical and physical analyses of the formed metal patterns are performed by EDX, XRD, FESEM, SEM, resistance and adhesion measurements. # 2001 Elsevier Science B.V. All rights reserved
Keywords :
Metallization , Integrated circuits , Polymers , radiation effects , Laser radiation , deposition , Films andcoatings , surface irradiation effects , Chemical reaction kinetics
Journal title :
Applied Surface Science
Serial Year :
2001
Journal title :
Applied Surface Science
Record number :
996895
Link To Document :
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