Title of article :
X-ray reflectivity studies of highly crystalline CeO2 films on (1 1 0 2) Al2O3
Author/Authors :
S.H Bang، نويسنده , , J.H Cho، نويسنده , , H.K. Kim ، نويسنده , , H.J. Cho، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
4
From page :
257
To page :
260
Abstract :
We observed highly single crystalline epitaxial growth of CeO2 films on a (1 1 0 2) (r-cut) Al2O3 (sapphire) using X-ray reflectivity and diffraction. The X-ray reflectivity data indicate a presence of a thin interfacial layer between CeO2 film and r-cut sapphire with a lower electron density than that of CeO2. Above the interfacial layer, the mechanism of film growth deduced from the reflectivity and diffraction data indicates two-dimensional layer growth. The surface roughness of 394 Å thick film is 5 Å, and the film shows nearly strain-free growth.
Keywords :
Dielectric thin films , Interface structure and roughness , X-ray reflectivity
Journal title :
Applied Surface Science
Serial Year :
2001
Journal title :
Applied Surface Science
Record number :
996992
Link To Document :
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