Title of article :
Thermally evaporated aluminium thin films
Author/Authors :
N.G. Semaltianos، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
7
From page :
223
To page :
229
Abstract :
Aluminium thin films were grown on quartz substrates by metal thermal evaporation, with thicknesses between 18 and 100 nm and evaporation rates from 1 to 20 Å/s. The surface morphology of the films was examined by atomic force microscopy imaging and cross-compared. The change of the estimated surface roughness with film thickness and evaporation rate was investigated and discussed. The optical transmission of the films was measured from 200 to 800 nm and correlated to the corresponding surface morphology as determined by the film thickness and evaporation rate. The goal is to optimize the use of thermally evaporated aluminium films as semitransparent electrodes in fast photoconduction experiments involving molecular stacks of discotic liquid crystals.
Keywords :
Aluminium thin films , Photoconduction , atomic force microscopy , Structure and morphology-thickness , Nucleation , Thin films , Optical properties
Journal title :
Applied Surface Science
Serial Year :
2001
Journal title :
Applied Surface Science
Record number :
997410
Link To Document :
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