• Title of article

    On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process

  • Author/Authors

    Hisao Nagai، نويسنده , , Muneto Inayoshi، نويسنده , , Masaru Hori، نويسنده , , Toshio Goto، نويسنده , , Mineo Hiramatsu، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    6
  • From page
    284
  • To page
    289
  • Abstract
    To clarify the ablation mechanism of polytetrafluoroethylene (PTFE) by synchrotron radiation (SR), the effect of the photon energy distribution of an SR beam on the ablation rate was examined. Carbon (C) and a carbon/magnesium fluoride/carbon (C/MgFx/C) membranes were used as filters to modify the photon energy distribution of incident SR beam. The fragments resulting from the decomposition of PTFE by SR irradiation were measured with in situ quadruple mass spectroscopy (QMS). The ablation mechanism of PTFE is due to absorption of the SR by fluorine. In addition, SR ablation was applied to form patterns in metal fluoride films for the first time.
  • Keywords
    Synchrotron radiation , Ablation , Polytetrafluoroethylene , Micromachining
  • Journal title
    Applied Surface Science
  • Serial Year
    2001
  • Journal title
    Applied Surface Science
  • Record number

    997417