Title of article :
In situ RHEED monitor of the growth of epitaxial anatase TiO2 thin films
Author/Authors :
In situ RHEED monitor of the growth of epitaxial anatase TiO2 thin films Original Research Article Pages 47-51 C.K. Ong، نويسنده , , S.J. Wang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
5
From page :
47
To page :
51
Abstract :
Epitaxial anatase TiO2 thin films were successfully grown on (0 0 1) SrTiO3 substrates by the laser molecular-beam epitaxy (laser-MBE) method. The whole growth process is monitored by in situ reflection high-energy electron diffraction (RHEED). RHEED monitoring shows a transition from a streaky pattern to a spot pattern during deposition, indicating different growth modes of TiO2 film. The RHEED patterns are in consistent with the RHEED intensity oscillation results. The atomic force microscopy (AFM) and X-ray diffraction (XRD) investigation show that the thin films have single crystalline orientation with roughness less than three unit cells.
Keywords :
Laser deposition , Surfaces and interfaces , Reflection high-energy electron diffraction , Dielectric thin films
Journal title :
Applied Surface Science
Serial Year :
2001
Journal title :
Applied Surface Science
Record number :
997508
Link To Document :
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