Title of article :
Surface investigation of adhesive formulation consisting of UV sensitive triblock poly(styrene–b-butadiene–b-styrene) copolymer
Author/Authors :
Maud Staeger، نويسنده , , Eric Finot، نويسنده , , Claire-Hélène Brachais، نويسنده , , Stéphane Auguste، نويسنده , , Herve Durand، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Abstract :
Atomic force microscopy (AFM) analysis in conjunction with macroscopic studies such as peel testing and contact angle measurement have been undertaken to explain the nanomechanical properties of adhesive formulation consisting of triblock poly(styrene–b-butadiene–b-styrene) (SBS) copolymers. The cross-linking of this photosensitive copolymer was investigated by analyzing the mechanical and morphological changes of each phase induced by the UV exposure. Main result is that the adhesive properties are strongly influenced by the cross-linking of the polybutadiene (PB) phase leading to an increase in the surface stiffness without affecting the surface energy. AFM analysis shows that the adhesion force is mostly governed by the contact area between the adhesive and the probe. The surface mobility may explain the increase in adhesion for this pressure sensitive copolymer.
Keywords :
Adhesion force , atomic force microscopy , Triblock copolymer , Surface treatment , Peel testing , Contact angle
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science