Structural characterization of chemically deposited Bi2S3 and Bi2Se3 thin films

Simple and inexpensive chemical deposition methods were used to deposit bismuth trisulfide (Bi2S3) and bismuth triselenide (Bi2Se3) thin films onto amorphous glass substrate at relatively low temperatures. Deposition parameters are optimized to get nanocrystalline films. These films are used for structural, surface morphological and compositional analyses. Stoichiometry and film formation are confirmed by X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDAX) and Rutherford back scattering (RBS) analyses. Surface coverage and roughness of the films are studied from scanning electron microscopy (SEM) and atomic force microscopy (AFM) images. High resolution transmission electron microscopy (HRTEM) study has confirmed the nanostructure of Bi2S3 and Bi2Se3 films.