Title of article :
Deep levels in silicon carbide Schottky diodes
Author/Authors :
A. Castaldini، نويسنده , , A. Cavallini، نويسنده , , L. Polenta، نويسنده , , F. Nava-Alonso، نويسنده , , C. Canali، نويسنده , , C. Lanzieri، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
5
From page :
248
To page :
252
Abstract :
Native or process-induced defective states may significantly affect the transport properties of silicon carbide devices. For this reason, it is of major importance to detect them and, when possible, to identify their origin. This contribution deals with the deep levels detected by deep level transient spectroscopy analyses in silicon carbide Schottky detectors. Current–voltage and capacitance–voltage characteristics have also been studied to investigate Schottky barrier properties and diode quality. On the basis of the comparison with literature data, some of the deep levels found can be attributed to impurities introduced during growth.
Keywords :
Silicon carbide , Deep levels , ICTs , DLTS , Capture cross-section
Journal title :
Applied Surface Science
Serial Year :
2002
Journal title :
Applied Surface Science
Record number :
997677
Link To Document :
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