• Title of article

    Deep levels in silicon carbide Schottky diodes

  • Author/Authors

    A. Castaldini، نويسنده , , A. Cavallini، نويسنده , , L. Polenta، نويسنده , , F. Nava-Alonso، نويسنده , , C. Canali، نويسنده , , C. Lanzieri، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2002
  • Pages
    5
  • From page
    248
  • To page
    252
  • Abstract
    Native or process-induced defective states may significantly affect the transport properties of silicon carbide devices. For this reason, it is of major importance to detect them and, when possible, to identify their origin. This contribution deals with the deep levels detected by deep level transient spectroscopy analyses in silicon carbide Schottky detectors. Current–voltage and capacitance–voltage characteristics have also been studied to investigate Schottky barrier properties and diode quality. On the basis of the comparison with literature data, some of the deep levels found can be attributed to impurities introduced during growth.
  • Keywords
    Silicon carbide , Deep levels , ICTs , DLTS , Capture cross-section
  • Journal title
    Applied Surface Science
  • Serial Year
    2002
  • Journal title
    Applied Surface Science
  • Record number

    997677