Title of article
Investigation on hydrogen annealing effect for various ferroelectric films by electrostatic force microscope
Author/Authors
S. Shin، نويسنده , , U.H. Pi، نويسنده , , D.J. Kim، نويسنده , , B.S. Kang، نويسنده , , T.W. Noh، نويسنده , , Z.G. Khim، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
5
From page
411
To page
415
Abstract
Scanning probe microscope with a dc bias and an ac modulation signal applied to the probing tip has been quite successful for investigating the characteristics in a sub-micron scale for the high density ferroelectric memory application field. The degradation of ferroelectric films—PbZr0.4Ti0.6O3 (PZT) and Bi3.25La0.75Ti3O12 (BLT)—caused by the hydrogen forming gas annealing is investigated in a microscopic scale by using an electrostatic force microscope (EFM). From the first harmonic signal of EFM, we obtained different polarization behaviors from as-grown and hydrogen-annealed ferroelectric films. We found that the hydrogen forming gas annealing is degrading the ferroelectric film with no catalyst top electrode on top of the film. It is believed that the annealing process causes the diffusion of hydrogen into the ferroelectric film resulting in the destruction of polarization in these materials. We speculate that the different degradation behavior among these materials (PZT and BLT) is due to the different cohesivity of hydrogen in these materials.
Keywords
Ferroelectric film , EFM , Hydrogen forming gas annealing , BLT , PZT
Journal title
Applied Surface Science
Serial Year
2002
Journal title
Applied Surface Science
Record number
997750
Link To Document