Title of article :
Threshold of ultra-short pulse laser-induced damage in dielectric materials
Author/Authors :
T.Q. Jia، نويسنده , , R.X. Li، نويسنده , , Z. Liu، نويسنده , , H. Chen، نويسنده , , Z.Z. Xu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
6
From page :
78
To page :
83
Abstract :
The one- and the two-photon absorption rates of conduction-band electrons (CBEs) in dielectric materials are calculated by second- and third-order perturbation theory, respectively. Here fused silica irradiated under 526 nm ultra-short pulse laser is used as an example. Compared with the case that only the one-photon absorption of CBE assisted by a phonon is considered, the rate of total energy gain of CBE from laser field will be enhanced by a factor of 3 when both of the one- and the two-photon absorption are included. The avalanche rate includes not only the term proportional to laser intensity, but also the terms proportional to the square of laser intensity and to the product of laser intensity and hole density. The damage threshold is calculated on the basis of the avalanche model, and find it is lowered by about 15% compared with the case for only the one-photon absorption of CBE assisted by a phonon is considered. The theoretical value agrees well with experimental results.
Keywords :
One-photon absorption rates , Two-photon absorption rates , Dielectric materials , Ultra-short pulse laser , Damage threshold
Journal title :
Applied Surface Science
Serial Year :
2002
Journal title :
Applied Surface Science
Record number :
997784
Link To Document :
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