Title of article :
Diffusion process of electrons injected from STM tip into AlGaAs/GaAs quantum wells
Author/Authors :
T. Tsuruoka، نويسنده , , Y. Ohizumi، نويسنده , , R. Tanimoto، نويسنده , , R. Arafune، نويسنده , , S. Ushioda، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
4
From page :
275
To page :
278
Abstract :
We have investigated the electron diffusion process in Al0.3Ga0.7As/GaAs quantum well (QW) structures by means of scanning tunneling microscope light emission (STM-LE) spectroscopy. The optical measurements were performed on a cleaved (1 1 0) surface at room temperature. The STM-LE spectra were measured by injecting hot electrons from the tip positioned at different distances from the QWs. The emission intensity from individual wells as a function of the tip-well distance was found to decay with two distinct decay constants. From comparison with Monte Carlo simulations for hot electron relaxation, we found that the intervalley scattering from the Γ valley to the L and X valleys has the most significant effect on the diffusion process of the injected electrons.
Keywords :
Light emission spectroscopy , Electron diffusion process , AlGaAs/GaAs , Quantum wells , Thermalization process , STM
Journal title :
Applied Surface Science
Serial Year :
2002
Journal title :
Applied Surface Science
Record number :
997872
Link To Document :
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