Title of article :
Electrical peculiarities in Al/Si/Ge/…/Ge/Si and Al/SiGe/Si structures
Author/Authors :
Zs.J. Horvath، نويسنده , , K. Jarrend?hl، نويسنده , , M. ?d?m، نويسنده , , I. Szabo، نويسنده , , Vo. Van Tuyen، نويسنده , , Zs. Czig?ny، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
5
From page :
403
To page :
407
Abstract :
The current–voltage (I–V) and capacitance–voltage (C–V) behaviour of different Si/Ge multilayers and SiGe single layers prepared on p-type Si substrates by magnetron sputtering and annealing, has been studied in the temperature range of 80–320 K by using Al Schottky contacts as test structures. Although a significant influence of the microstructure of the Si/Ge multilayers and SiGe layers was obtained on the electrical behaviour of the structures, the structures exhibited similar specific features.
Keywords :
Schottky barrier , SiGe , Superlattice , Amorphous , Electrical behaviour , Si
Journal title :
Applied Surface Science
Serial Year :
2002
Journal title :
Applied Surface Science
Record number :
997898
Link To Document :
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