Thickness dependence of properties of SnO2:Sb films deposited on flexible substrates

Films of antimony doped tin oxide (SnO2:Sb) of various thickness were deposited on flexible substrates (polypropylene adipate, PPA) by r.f. magnetron sputtering technique at substrate temperature of 80 °C. The structural, electrical and optical properties of the films were studied for different thickness in detail. X-ray diffraction (XRD) studies revealed that all the deposited films are polycrystalline and retain the rutile structure. Hall measurements showed that the thicker films (about 400 nm) have relatively higher Hall mobility compared with those of thinner films. The electrical resistivity was found to be about 2×10−3 Ω cm for a film with thickness of 400 nm deposited at substrate temperature of 80 °C, and the average transmittance in the visible range was found to be 84%.