Author/Authors :
Tetsuo Tsuchiya، نويسنده , , Hiroyuki Niino، نويسنده , , Akira Yabe، نويسنده , , Iwao Yamaguchi، نويسنده , , Takaaki Manabe، نويسنده , , Toshiya Kumagai، نويسنده , , Susumu Mizuta، نويسنده ,
Abstract :
Tin-doped indium oxide films have been grown on quartz substrate by the coating photolysis process. The optical and electrical properties of the obtained films were investigated. It was found that the resistivities of the In2O3 and ITO films depend on the irradiation atmosphere. The resistivities of the ITO film irradiated by the ArF laser in vacuum of 10−3 and 10−5 Torr were 1.0×10−3 and 6.0×10−4 Ω cm, respectively.
Keywords :
ITO , Coating photolysis process , ArF laser , Patterning
