Title of article :
Application of SIMS in microelectronics
Author/Authors :
T. K. Tsukamoto ، نويسنده , , S. Yoshikawa، نويسنده , , F. Toujou، نويسنده , , H. Morita، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
5
From page :
404
To page :
408
Abstract :
This paper, the present state and problems of secondary ion mass spectrometry are discussed from the viewpoint of characterization, both for various semiconductor and microelectronic materials and also in relation to other evaluation methods.
Keywords :
TOF-SIMS , LEIS , XPS , Growth mode
Journal title :
Applied Surface Science
Serial Year :
2003
Journal title :
Applied Surface Science
Record number :
998466
Link To Document :
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