Title of article :
MOCVD deposition of YSZ on stainless steels
Author/Authors :
S Chevalier، نويسنده , , M Kilo، نويسنده , , G Borchardt، نويسنده , , J.P Larpin، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Abstract :
Yttria stabilized zirconia was deposited on stainless steel using the metal–organic chemical vapor deposition (MOCVD) technique, from β-diketonate precursors. The variation of the evaporation temperatures of yttrium and zirconium precursor allowed to control the level of Y within the film. Over the temperature range 125–150 °C, the Y content increased from 2.5 to 17.6 at.%. X-ray diffraction (XRD) analyses evidenced tetragonal phase of zirconia when the Y content was below 8 at.%, and cubic phase for higher concentration. Sputtered neutral mass spectrometry (SNMS) profiles confirmed that the control and stability of Y precursor temperature were of major importance to guarantee the homogeneity of the deposited films.
Keywords :
YSZ , Zr(thd)4 , Y(thd)3 , MOCVD , Coatings , X-ray diffraction , SNMS profiles
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science