• Title of article

    Oxygen active species in an Ar–O2 magnetron discharge for titanium oxide deposition

  • Author/Authors

    VANCOPPENOLLE، Bart نويسنده , , P.-Y Jouan، نويسنده , , A Ricard، نويسنده , , M Wautelet، نويسنده , , Dauchot، O. نويسنده , , M Hecq، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    7
  • From page
    249
  • To page
    255
  • Abstract
    Emission spectroscopy of an Ar–O2 dc magnetron sputtering plasma has been performed at 3.5 cm above a Ti target. The behavior of O2+ and O have been studied by introducing O2 into the Ar plasma. The vibrational distributions of O2+ (b) radiative state have been determined. It is found to exhibit a quasi-Boltzmann distribution with vibrational temperatures between 2500 and 3500 K for discharge current between 200 and 500 mA at 5 mTorr. By comparing intensities of O and O2+ by emission spectroscopy and O2+ relative density by mass spectroscopy, the O/O2 relative dissociation rate is found to be followed by the IO/IO2+ optical intensity ratio. It is found to have an increase of nO/nO2 with the discharge current.
  • Keywords
    TiO2 thin films , Magnetron plasma , Optical emission spectroscopy
  • Journal title
    Applied Surface Science
  • Serial Year
    2003
  • Journal title
    Applied Surface Science
  • Record number

    998502