Title of article :
Development of a column delivering a collimated stream of Cs0 for SIMS purposes
Author/Authors :
Tobias Wirtz، نويسنده , , H.-N. Migeon، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
5
From page :
940
To page :
944
Abstract :
In order to optimize SIMS analyses using the presence of reactive Cs for the purpose of enhancing negative secondary ion emission or working in the MCsxþ mode, we have developed a column that delivers a collimated and adjustable stream of neutral Cs atoms to be deposited on the surface of the sample while this one is being analyzed. Using this new column, it was possible to introduce an analysis technique consisting of a Xyþ ion bombardment (where X stands for any element excepting Cs) accompanied by a simultaneous deposition of Cs0 at the surface of the sample. This experimental technique permits a successful decoupling of the sputtering and Cs introduction processes by avoiding the constraints imposed by an energetic Csþ ion bombardment. As a consequence, it becomes possible to optimize simultaneously the sensitivity of the analysis, by carefully adjusting the Cs concentration to its optimum value, and the depth resolution of the analysis, by choosing adequate primary bombardment conditions. In this paper, we will describe the new Cs0 column, which is based on an evaporation of pure metallic Cs, and outline its performances in terms of deposition rates, stability, beam dimensions and purity of the Cs deposit. # 2004 Elsevier B.V. All rights reserved.
Keywords :
Cesium evaporator , Cesium concentration , Cesium deposition
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
998627
Link To Document :
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