• Title of article

    Development of compact cluster ion sources using metal cluster complexes Ionization properties of metal cluster complexes

  • Author/Authors

    T. Mizota*، نويسنده , , H. Nonaka، نويسنده , , T. Fujimoto، نويسنده , , A. Kurokawa، نويسنده , , S. Ichimura، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    4
  • From page
    945
  • To page
    948
  • Abstract
    In order to develop a new compact cluster ion source as a low damage sputtering source for SIMS to analyze ultra-shallow dopant state we have studied the possibility of using a metal cluster complex as an ion beam source. Metal cluster complexes such as Os3(CO)12 and Ir4(CO)12 have been studied from the view point of their stability in high vacuum and how to ionize them by using the electron ionization QMS and the XeCl laser ionization TOF. In the case of electron ionization QMS, peaks of Os3(CO)nþ (n ¼ 0–12) and Ir4(CO)nþ (n ¼ 0–12) were observed without the fragment ions such as a monomer, a dimer, etc. In the case of laser ionization TOF, peaks of the fragment and the parent ions without a carbonyl ligand were observed from Os3(CO)12, and Ir4(CO)12. The temperature dependence of fragmentation has also been discussed. # 2004 Elsevier B.V. All rights reserved
  • Keywords
    Metal cluster complex , Cluster ion source , TOF , QMS
  • Journal title
    Applied Surface Science
  • Serial Year
    2004
  • Journal title
    Applied Surface Science
  • Record number

    998628