Title of article :
Latest developments for the CAMECA ULE-SIMS instruments:
IMS Wf and SC-Ultra
Author/Authors :
E. de Chambost، نويسنده , , A. Merkulov، نويسنده , , J. P. Pérès، نويسنده , , B. Rasser، نويسنده , , M. Schuhmacher، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
SIMS depth profiles for full wafer analyses were carried out on the CAMECA IMS Wf instrument. Experiments have been
performed in order to investigate the analytical performance of this SIMS instrument for shallow, medium and deep profiles in
terms of measurement repeatability and sample throughput. First results using a cassette loader option implemented on the IMS
Wf are presented.
# 2004 Elsevier B.V. All rights reserved
Keywords :
boron , Implant , SIMS , dose , repeatability , mapping
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
