• Title of article

    Evolution mechanism of heterointerface cross-section during growth of GaAs ridge quantum wires by selective molecular beam epitaxy

  • Author/Authors

    Taketomo Sato a، نويسنده , , Isao Tamai، نويسنده , , Souichi Yoshida، نويسنده , , Hideki Hasegawa a، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    5
  • From page
    11
  • To page
    15
  • Abstract
    The mechanism determining heterointerface cross-sections is studied for GaAs ridge quantum wires (QWRs) grown by selective molecular beam epitaxy (MBE). Arrays of h-1 1 0i- and h-1 -1 2i-orientated QWRs were grown on (0 0 1) and (1 1 1)B GaAs patterned substrates, respectively. A detailed investigation of cross-sections of wires has shown that the boundary planes appear on both sides of QWRs, keeping a constant angle, y, with respect to the flat top of the substrate pattern, and they determine the lateral wire width. Their evolution mechanism has turned out to be a kinetic process, reflecting differences in migration and atom incorporation rates on different facets. Simple formulas for y have been derived, and they have shown excellent agreements with experiment. This has led to precise kinetic control of the wire width by growth conditions. # 2004 Elsevier B.V. All rights reserved
  • Keywords
    Selective growth , Growth mechanism , Molecular beam epitaxy (MBE) , Patterned substrate , GaAs
  • Journal title
    Applied Surface Science
  • Serial Year
    2004
  • Journal title
    Applied Surface Science
  • Record number

    998688