Title of article
Barrier formation at metal–organic interfaces: dipole formation and the charge neutrality level
Author/Authors
H. Va´zquez، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
6
From page
107
To page
112
Abstract
The barrier formation for metal–organic semiconductor interfaces is analyzed within the induced density of interface states
(IDIS) model. Using weak chemisorption theory, we calculate the induced density of states in the organic energy gap and show
that it is high enough to control the barrier formation. We calculate the charge neutrality levels of several organic molecules:
3,4,9,10-perylenetetracarboxylic dianhydride (PTCDA), 3,4,9,10-perylenetetracarboxylic bisbenzimidazole (PTCBI) and
4,40,N,N0-dicarbazolyl biphenyl (CBP) and the interface Fermi level for their contact with a Au (1 1 1) surface. We find an
excellent agreement with the experimental evidence and conclude that the barrier formation is due to the charge transfer between
the metal and the states induced in the organic energy gap.
# 2004 Elsevier B.V. All rights reserved
Keywords
Charge neutrality level , Induced density of interface states , Energy level alignment , Fermi level pining , Metal–organic interface , Barrier formation
Journal title
Applied Surface Science
Serial Year
2004
Journal title
Applied Surface Science
Record number
998705
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