Correlation between deposition parameters and structural modification of amorphous carbon nitride (a-CNx) film in magnetron sputtering

The growth and structural evolution of the carbon nitride (CNx) film, deposited by rf magnetron sputtering in Ar/N2 discharge, were studied. The CNx (0.23≤x≤0.71) films were deposited on Si(1 0 0) at rf power between 50 and 250 W. Simultaneously, Ar/N2 gas ratio was varied from 0 to 18 with total pressure kept at 6.6×10−1 Pa. The composition, structure, and chemical bonding configuration of the CNx films were found to be strongly dependent on deposition parameters (rf power and Ar/N2 gas ratio). Based on these results, a relationship between deposition parameter and film properties ([N]/[C] ratio, surface roughness, and sp3/sp2 bond ratio) was established.