Title of article :
In situ deposition of neutral Cs for Secondary Ion Mass Spectrometry
Author/Authors :
Tobias Wirtz، نويسنده , , H.-N. Migeon، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
12
From page :
186
To page :
197
Abstract :
The Cation Mass Spectrometer (CMS) is a new instrument allowing to optimize the advantageous quantification technique consisting in analyzing MCsxþ clusters. To further enhance the potential of this instrument, we have developed a column that delivers a collimated and adjustable stream of neutral Cs atoms to be deposited on the surface of the sample while this one is being analyzed by Secondary Ion Mass Spectrometry (SIMS). Using this new column, it was possible to introduce an analysis technique consisting of a Xyþ ion bombardment (where X stands for any element except Cs) accompanied by a simultaneous deposition of Cs0 at the surface of the sample. This experimental technique permits a successful decoupling of the sputtering and Cs introduction processes by avoiding the constraints imposed by an energetic Csþ ion bombardment. As a consequence, it becomes possible to optimize simultaneously the sensitivity of the analysis, by carefully adjusting the Cs concentration to its optimum value, and the depth resolution of the analysis, by choosing adequate primary bombardment conditions. In this paper, we will first describe the new Cs0 column and outline its performances. In a second part, we will focus on the analytical aspect and study the ability to vary the Cs concentration over a complete and continuous range. Experiments using a Gaþ primary bombardment show in particular that the Cs concentration produced during analyses performed with the mentioned technique only depends on the characteristics of the analyzed material and the ratio between the erosion and deposition rates, but not on the individual values of these two rates. # 2003 Elsevier B.V. All rights reserved.
Keywords :
Cesium concentration , Sputtering , Secondary ion mass spectrometry , Quantification , Cesium deposition , Cesium evaporator
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
999061
Link To Document :
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