Title of article :
Diffusion length of carriers and excitons in GaN—influence of epilayer microstructure
Author/Authors :
M. Godlewski، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
9
From page :
294
To page :
302
Abstract :
We demonstrate a correlation between the microstructure of epilayers and the diffusion length of free carriers and excitons in heteroepitaxial and homoepitaxial GaN films. We show that the diffusion length is shorter than predicted for a given density of dislocations. With improving structural quality of the films and lower dislocation density the diffusion lengths of free carriers and excitons increase, which, in turn, increases the rate of nonradiative recombination at dislocations. This process may explain a surprisingly small change of light emission efficiency observed for GaN epilayers with varying densities of dislocations. # 2003 Elsevier B.V. All rights reserved
Keywords :
recombination , Dislocations , diffusion , GaN
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
999140
Link To Document :
بازگشت