Title of article
Diffusion length of carriers and excitons in GaN—influence of epilayer microstructure
Author/Authors
M. Godlewski، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
9
From page
294
To page
302
Abstract
We demonstrate a correlation between the microstructure of epilayers and the diffusion length of free carriers and excitons in
heteroepitaxial and homoepitaxial GaN films. We show that the diffusion length is shorter than predicted for a given density of
dislocations. With improving structural quality of the films and lower dislocation density the diffusion lengths of free carriers
and excitons increase, which, in turn, increases the rate of nonradiative recombination at dislocations. This process may explain
a surprisingly small change of light emission efficiency observed for GaN epilayers with varying densities of dislocations.
# 2003 Elsevier B.V. All rights reserved
Keywords
recombination , Dislocations , diffusion , GaN
Journal title
Applied Surface Science
Serial Year
2004
Journal title
Applied Surface Science
Record number
999140
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