Growth of high quality epitaxial Si1 x yGexCy layers by using chemical vapor deposition

The epitaxial quality of non-selective and selective deposition of Si1 x yGexCy (0 x 0:30, 0 y 0:02) layers has been optimized by using high-resolution reciprocal lattice mapping (HRRLM). The main goal was to incorporate a high amount of substitutional carbon atoms in Si or Si1 xGex matrix without creating defects. The carbon incorporation behavior was explained by chemical and kinetic effects of the reactant gases during epitaxial process. Although high quality epitaxial Si1 yCy layers can be deposited, lower electron mobility compared to Si layers was observed. # 2003 Elsevier B.V. All rights reserved.