Title of article :
Adsorption kinetics of dimethylsilane at Si(0 0 1)
Author/Authors :
Karuppanan Senthil، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
5
From page :
183
To page :
187
Abstract :
Adsorption kinetics of dimethylsilane (DMS) at Si(0 0 1) surface has been investigated by using temperature-programmed desorption (TPD). The saturated hydrogen coverage of two monolayer was identical with that from monomethylsilane (MMS)- saturated surface. By being combined with the C/H ratios within a molecule (1/6 for MMS and 1/4 for DMS), this fact suggests enhanced C incorporation by DMS as compared with MMS by a factor of 1.5. The TPD spectra are deconvoluted into b1 ( 510 8C), b10 ( 550 8C), g ( 615 8C) and d ( 910 8C) peaks. The appearance of the bulk C-related g peak from the very initial adsorption, in contrast to MMS, is consistent with the enhanced C incorporation. Although the hydrogen uptake (H-uptake) curve is quantitatively fitted with the four-site adsorption model, discussions on the sub-peak assignments suggest presence of further decompositions of ad-species at initial adsorptions. # 2003 Elsevier B.V. All rights reserved
Keywords :
SiC , Monomethylsilane , hydrogen desorption , Adsorption kinetics , TPD , Si(0 0 1) , Dimethylsilane
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
999185
Link To Document :
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