Title of article :
The comparison of isolation technologies and device models on SiGe bipolar low noise amplifier
Author/Authors :
W.-C. Hua، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
4
From page :
425
To page :
428
Abstract :
Junction isolation is promising for cost reduction and high power circuit applications due to its relatively lower fabrication complexity and thermal conductivity, but larger area and collector-substrate capacitance (Ccs) seem drawbacks as compared to the deep trench isolation (DTI) technology. A simulation work is proposed for the size selection guide of unit cell to have the low cost benefit of junction isolation without sacrificing the gain and noise performance of the low noise amplifier (LNA) operated at 5.2 GHz. # 2003 Elsevier B.V. All rights reserved.
Keywords :
SiGe , low noise amplifier , Deep trench isolation , Junction isolation , Mextram 504
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
999231
Link To Document :
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