Title of article
Influence of target to substrate spacing on the properties of ITO thin films
Author/Authors
Aldrin Antony، نويسنده , , M. Nisha، نويسنده , , R. Manoj، نويسنده , , M.K. Jayaraj، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
8
From page
294
To page
301
Abstract
Indium tin oxide thin films were deposited at room temperature on glass substrates by RF magnetron sputtering. The
structural, electrical and optical properties of the films showed a dependence on target to substrate spacing and annealing
temperature. Films deposited with a target to substrate spacing of 4 cm showed the lowest resistivity of 3:07 10 3 O cm and
maximum band gap of 3.89 eV on annealing at a temperature of 250 8C under high vacuum for 1 h.
# 2003 Elsevier B.V. All rights reserved
Keywords
indium tin oxide , RF magnetron sputtering , annealing
Journal title
Applied Surface Science
Serial Year
2004
Journal title
Applied Surface Science
Record number
999269
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