Title of article
Photoluminescence of Er-doped hydrogenated amorphous silicon nitride
Author/Authors
Q. Zhao، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
6
From page
306
To page
311
Abstract
Er photoluminescence (Er PL) and dangling bonds (DBs) of annealed Er-doped hydrogenated amorphous silicon nitride (a-
SiN:H(Er)) with various concentrations of nitrogen are studied in the temperature range 62–300 K. Post-annealing process is
employed to change the DBs density of a-SiN:H(Er). PL spectra, DBs density and H, N concentrations are measured. The
intensity of Er PL displays complicated relation with Si DBs density within the annealing temperature range 200–500 8C. The
intensity of Er PL first increases with decreasing density of Si dangling bonds owing to the structural relaxation up to 250 8C, and
continues to increase up to 350 8C even though the density of Si DBs increases due to the improvement of symmetry
environment of Er3þ.
# 2003 Elsevier B.V. All rights reserved
Keywords
Er-doped , Photoluminescence , a-si , Co-sputtering , annealing
Journal title
Applied Surface Science
Serial Year
2004
Journal title
Applied Surface Science
Record number
999379
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