Diffractive optical elements written by photodeposition

In this work direct laser writing of diffractive optical elements (DOE) by photodeposition (PD) of amorphous selenium (a-Se) from colloid solutions has been investigated. We used a computer controlled laser scanner for patterning thin film micro-profiles creating thus planar optical elements by direct beam writing on surfaces immersed in a liquid phase PD cell. The laser employed was an argon ion laser at 488 nm wavelength, with powers up to 55 mW, for writing typically 25–250 μm wide lines of 200 nm thickness at rates of about 150 μm/s. Various elements made of photodeposited thin films on polymethyl-methacrylate (PMMA) substrates were produced for prototyping microlenses, linear grating arrays, cylindrical and circular profiled DOE patterns.