• DocumentCode
    1277
  • Title

    Chemical Vapor Deposition of Thin Films for ULSI Interconnect Metallization

  • Author

    Andrew W. Maverick استاد مشاور , Kerry M. Dooley استاد مشاور , Douglas P. Harrison استاد مشاور , Gregory L.Griffin استاد راهنما

  • University
    Lovisiana State University
  • Grade
    دكتري
  • Major
    Doctor of Philosophy )Ph.D.( )Chemical Engineering(
  • Number of pages
    0
  • Publish Date
    2005
  • Keyword

    interconnect metallization , Cu)hfac(2 , Copper , Reaction Mechanism , chemical vapor deposition , TaF5 , barrier layer , electroless deposition , SiH4 , seed layer , Pd)hfac(2 , tantalum , PALLADIUM

  • Note
    01
  • Language
    انگليسي
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=17&DC=1277