DocumentCode
1572
Title
Low Dielectric Constant Fluorocarbon Films Containing Silicon by Plasma Enhanced Chemical Vapor Deposition
Author
Aravamudhan Raman استاد مشاور , Pratul K. Ajmera استاد راهنما , Gil S. Lee استاد مشاور
University
Lovisiana State University
Grade
دكتري
Major
Doctor of Philosophy )Ph.D.( )Electrical Computer Engineering(
Number of pages
0
Publish Date
2005
Keyword
SiCF , low-k , Surface modification , ultralow-k , Dielectrics , fluorocarbon , silicon containing , PECVD
Note
01
Language
انگليسي
Link To Document