DocumentCode
22584
Title
Si-SiO2 interface behavior in n-MOSFETs with screening potential during high-field injection
Author
Misra Durgamadhab استاد راهنما , Tsybeskov Leonid استاد مشاور
University
Van Houten Library )new Jersey Institute Of Technology(
Grade
نامعلوم
Major
Master of Science )Department of Electrical and Computer Engineering(
Number of pages
0
Publish Date
2004
Keyword
n-channel MOSFETs , Hot carrier stress degradation , Plasma processing
Note
01
Language
انگليسي
Link To Document