DocumentCode :
3447
Title :
Synthesis and characterization of low pressure chemically vapor deposited boron nitride and titanium nitride films
Author :
Levy Roland A. استاد راهنما , Ravindra N. M. استاد مشاور
University :
Van Houten Library )new Jersey Institute Of Technology(
Grade :
دكتري
Major :
Doctor of Philosophy )Committee for the Interdisciplinary Program in Materials Science and Engineering(
Number of pages :
0
Publish Date :
2000
Keyword :
Titanium nitride , Low Pressure Chemically Vapor Deposited Films , boron nitride
Note :
01
Language :
انگليسي
Link To Document :
بازگشت