DocumentCode
3625
Title
Mathematical modeling of chemical vapor deposition processes and its application to thin film technology
Author
Lewandowski Gordon استاد مشاور , Huang Ching-Rong استاد راهنما
University
Van Houten Library )new Jersey Institute Of Technology(
Grade
دكتري
Major
Doctor of Philosophy )Chemical Engineering(
Number of pages
0
Publish Date
1991
Keyword
Vapor-plating--Mathematical models , hin films
Note
01
Language
انگليسي
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