DocumentCode :
3625
Title :
Mathematical modeling of chemical vapor deposition processes and its application to thin film technology
Author :
Lewandowski Gordon استاد مشاور , Huang Ching-Rong استاد راهنما
University :
Van Houten Library )new Jersey Institute Of Technology(
Grade :
دكتري
Major :
Doctor of Philosophy )Chemical Engineering(
Number of pages :
0
Publish Date :
1991
Keyword :
Vapor-plating--Mathematical models , hin films
Note :
01
Language :
انگليسي
Link To Document :
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