Title :
Etch rate modification by implantation of oxide and polysilicon for planar double gate MOS fabrication
Author :
Collaert Nadine استاد مشاور , Bayot Vincent استاد راهنما
University :
UCL )Les Bibliotheques de L,Universite Catholique de Louvain(
Major :
FSA 3 - Doctorat en sciences appliqu{ف }es
Keyword :
Etch rate modification , Planar double gate , Buried mask , Etching selectivity , Ion implantation
