Title :
SELECTIVE CHEMICAL VAPOR DEPOSITION OF HEAVILY BORON DOPED SILICON-GERMANIUM FILMS FROM DISILANE, GERMANE AND CHLORINE FOR SOURCE/DRAIN JUNCTIONS OF NANOSCALE CMOS
Author :
Mehmet C. Ozturk استاد راهنما , John R. Hauser استاد مشاور , Carlton M. Osburn استاد مشاور , Dennis M. Maher استاد مشاور
University :
Raleigh North carolina state university
Major :
PhD )Electrical Engineering(
Keyword :
transistor , selective , source , DRAIN , MOSFET , SiGe
