• DocumentCode
    8817
  • Title

    SELECTIVE CHEMICAL VAPOR DEPOSITION OF HEAVILY BORON DOPED SILICON-GERMANIUM FILMS FROM DISILANE, GERMANE AND CHLORINE FOR SOURCE/DRAIN JUNCTIONS OF NANOSCALE CMOS

  • Author

    Mehmet C. Ozturk استاد راهنما , John R. Hauser استاد مشاور , Carlton M. Osburn استاد مشاور , Dennis M. Maher استاد مشاور

  • University
    Raleigh North carolina state university
  • Grade
    نامعلوم
  • Major
    PhD )Electrical Engineering(
  • Number of pages
    0
  • Publish Date
    2002
  • Keyword

    transistor , selective , source , DRAIN , MOSFET , SiGe

  • Note
    01
  • Language
    انگليسي
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=17&DC=8817