Application of reactive DC magnetron sputtering system in fabrication of a nanostructure copper oxide thin film as a sensing transducer

Uniform sputtered nanostructure copper oxide (Nano-CuO) thin film on the conductive fluorinatedtin oxide (FTO) substrate was obtained by reactive direct current (DC) magnetron sputtering system at the optimized instrumental deposition conditions. The deposited Nano-CuO thin film was characterized by using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), energy dispersive X-Ray spectroscopy (EDX), ultra-violet visible spectrophotometry and electrochemical methods. The crystalline phases, morphology, optical properties and resistivity of the Nano-CuO thin films are found to be significantly influenced by the changes in target-tosubstrate distance, Ar to O2 gas flow ratio, sputtering power and deposition time. The Nano-CuO thin film prepared at the optimum conditions has exhibited high porosity, uniformity and low resistivity; thus, it could be used as an excellent sensing transducer platform in biosensor fabrication.