شماره ركورد كنفرانس :
4865
عنوان مقاله :
Optimization of deposition voltage for copper electrodeposition on FTO from non-acidic solution
پديدآورندگان :
Jamia S siavjami@sci.uut.ac.ir Urmia University of Technology, , Behboudniaa , M Urmia University of Technology, , Nobarib N Mahabad Branch, Islamic Azad University,
كليدواژه :
Copper , Electrodeposition , Coating , Thin Film , Morphology
عنوان كنفرانس :
بيست و دومين كنفرانس ملي شيمي فيزيك ايران
چكيده فارسي :
In this study, the electrochemical voltage of copper has been improved. Using CuSO4 as a copper source, we obtained thin film layers in a non-acidic environment. This was done within 250 seconds at -1.1 volts. The as-synthesized Cu/FTO samples were characterized by scanning electron microscopy (SEM). The results show that in the non-acidic environment, this layer can be found.
