DocumentCode :
1000145
Title :
Modeling the partition of noise from the gate-tunneling current in MOSFETs
Author :
Ranuárez, Juan C. ; Deen, M. Jamal ; Chen, Chih-Hung
Author_Institution :
Dept. of Electr. & Comput. Eng., McMaster Univ., Hamilton, Ont., Canada
Volume :
26
Issue :
8
fYear :
2005
Firstpage :
550
Lastpage :
552
Abstract :
Expressions for the spectral densities of the gate/source and gate/drain noise currents caused by current flow through the gate oxide of MOSFETs are derived. It is shown that these noise currents can also be expressed in terms of equivalent gate and drain noise currents, and by linearizing the position dependence of the gate current density, simple analytic expressions for these equivalent noise currents and their correlation are obtained in terms of the total gate current and the drain/source partition ratio. It is also shown that the predictions of this simple theory are consistent with published experimental data and results from numerical simulations.
Keywords :
MOSFET; leakage currents; semiconductor device models; semiconductor device noise; shot noise; tunnelling; MOSFET; drain-source partition ratio; equivalent noise currents; gate current density; gate-drain noise currents; gate-source noise current; gate-tunneling current; leakage currents; noise partition modeling; position dependence; semiconductor device modeling; semiconductor device noise; shot noise; spectral densities; 1f noise; Acoustical engineering; Current density; Fluctuations; Frequency; Low-frequency noise; MOSFETs; Numerical simulation; Signal to noise ratio; Tunneling; MOSFETs; leakage currents; shot noise; tunneling;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2005.851813
Filename :
1468219
Link To Document :
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