• DocumentCode
    1001065
  • Title

    Comparison of the degradation effects of heavy ion, electron, and cobalt-60 irradiation in an advanced bipolar process

  • Author

    Zoutendyk, John A. ; Goben, Charles A. ; Berndt, Dale F.

  • Author_Institution
    Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
  • Volume
    35
  • Issue
    6
  • fYear
    1988
  • fDate
    12/1/1988 12:00:00 AM
  • Firstpage
    1428
  • Lastpage
    1431
  • Abstract
    Experimental measurements are reported of the degradation effects of high-energy particles (heavy ion (Br) and electron) and Co-60 gamma-rays on the current gain of minimum-geometry bipolar transistors made from an advanced process. The data clearly illustrate the total-ionizing-dose/particle-fluence behavior of this bipolar transistor produced by an advanced process. In particular, bulk damage from Co-60 gamma rays in bipolar transistors (base transport factor degradation) and surface damage in bipolar transistors from ionizing radiation (emitter-efficiency degradation) have been observed. The true equivalence between various types of radiation for this process technology has been determined on the basis of damage from the log[K1] intercepts
  • Keywords
    bipolar transistors; bromine; electron beam effects; gamma-ray effects; ion beam effects; radiation hardening (electronics); semiconductor technology; 60Co gamma rays; Br ions; Co-60 gamma-rays; advanced bipolar process; base transport factor degradation; bulk damage; current gain; degradation; emitter-efficiency degradation; equivalence between types of radiation; high-energy particles; ionizing radiation; minimum-geometry bipolar transistors; radiation hardened electronics; surface damage; total-ionizing-dose/particle-fluence behavior; Bipolar transistors; Current measurement; Degradation; Electrons; Gain measurement; Gamma ray effects; Laboratories; Neutrons; Particle measurements; Propulsion;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.25475
  • Filename
    25475