• DocumentCode
    1001077
  • Title

    Evidence of bandgap-narrowing in the space-charge layer of heavily doped silicon diodes

  • Author

    Lowney, J.R. ; Thurber, W.R.

  • Author_Institution
    National Bureau of Standards, Semiconductor Materials & Processes Division, Washington, USA
  • Volume
    20
  • Issue
    3
  • fYear
    1984
  • Firstpage
    142
  • Lastpage
    143
  • Abstract
    The gradient voltage has been measured for seven heavily doped, graded-junction silicon diodes at 300 K. Experimental values up to nearly 0.5 V lower than conventional theoretical predictions have been observed. The lowering is attributed to bandgap-narrowing in the space-charge region. This narrowing is expected to be much larger than in neutral material of the same doping density because of the absence of free-carrier screening.
  • Keywords
    elemental semiconductors; heavily doped semiconductors; p-n homojunctions; semiconductor diodes; semiconductor doping; silicon; space charge; 300K; Bandgap-narrowing; Si diodes; elemental semiconductor; graded-junction; gradient voltage; heavy doping; space-charge layer;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19840096
  • Filename
    4249707