DocumentCode
1001077
Title
Evidence of bandgap-narrowing in the space-charge layer of heavily doped silicon diodes
Author
Lowney, J.R. ; Thurber, W.R.
Author_Institution
National Bureau of Standards, Semiconductor Materials & Processes Division, Washington, USA
Volume
20
Issue
3
fYear
1984
Firstpage
142
Lastpage
143
Abstract
The gradient voltage has been measured for seven heavily doped, graded-junction silicon diodes at 300 K. Experimental values up to nearly 0.5 V lower than conventional theoretical predictions have been observed. The lowering is attributed to bandgap-narrowing in the space-charge region. This narrowing is expected to be much larger than in neutral material of the same doping density because of the absence of free-carrier screening.
Keywords
elemental semiconductors; heavily doped semiconductors; p-n homojunctions; semiconductor diodes; semiconductor doping; silicon; space charge; 300K; Bandgap-narrowing; Si diodes; elemental semiconductor; graded-junction; gradient voltage; heavy doping; space-charge layer;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19840096
Filename
4249707
Link To Document