• DocumentCode
    1001287
  • Title

    High rate magnetron sputtering of ferromagnetic SmCo, Fe and CoCr thin films

  • Author

    Röll, K. ; Kukla, R. ; Mayr, M. ; Münz, W.D.

  • Author_Institution
    LEYBOLD-HERAEUS GMBH, postfach, Hanau
  • Volume
    20
  • Issue
    1
  • fYear
    1984
  • fDate
    1/1/1984 12:00:00 AM
  • Firstpage
    63
  • Lastpage
    65
  • Abstract
    Ferromagnetic thin films have been sputtered from a modified conventional magnetron cathode (3" diameter). The targets (5 to 6 mm thick) were stainless steel, demagnetized SmCo5and CoCr(15-18 at% Cr). The deposition rate was 6 nm/s at a power density of 15 W/cm2. Increasing the power rates up to 12 nm/s could be achieved. The saturation magnetization ranged from 0.4 to 1,5 Tesla. The films sputtered from stainless steel had a magnetization only 30 % smaller than the magnetization of Fe. The coercive force varied from 0.8 to 75 kA/m.
  • Keywords
    Magnetic recording/recording materials; Magnetrons; Sputtering; Cathodes; Coercive force; Demagnetization; Iron; Magnetic films; Magnetic shielding; Saturation magnetization; Sputtering; Steel; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1984.1063030
  • Filename
    1063030