DocumentCode
1001287
Title
High rate magnetron sputtering of ferromagnetic SmCo, Fe and CoCr thin films
Author
Röll, K. ; Kukla, R. ; Mayr, M. ; Münz, W.D.
Author_Institution
LEYBOLD-HERAEUS GMBH, postfach, Hanau
Volume
20
Issue
1
fYear
1984
fDate
1/1/1984 12:00:00 AM
Firstpage
63
Lastpage
65
Abstract
Ferromagnetic thin films have been sputtered from a modified conventional magnetron cathode (3" diameter). The targets (5 to 6 mm thick) were stainless steel, demagnetized SmCo5 and CoCr(15-18 at% Cr). The deposition rate was 6 nm/s at a power density of 15 W/cm2. Increasing the power rates up to 12 nm/s could be achieved. The saturation magnetization ranged from 0.4 to 1,5 Tesla. The films sputtered from stainless steel had a magnetization only 30 % smaller than the magnetization of Fe. The coercive force varied from 0.8 to 75 kA/m.
Keywords
Magnetic recording/recording materials; Magnetrons; Sputtering; Cathodes; Coercive force; Demagnetization; Iron; Magnetic films; Magnetic shielding; Saturation magnetization; Sputtering; Steel; Voltage;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1984.1063030
Filename
1063030
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