• DocumentCode
    1001512
  • Title

    Lateral charge transport from heavy-ion tracks in integrated circuit chips

  • Author

    Zoutendyk, J.A. ; Schwartz, H.R. ; Nevi, L.R.

  • Author_Institution
    Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
  • Volume
    35
  • Issue
    6
  • fYear
    1988
  • fDate
    12/1/1988 12:00:00 AM
  • Firstpage
    1644
  • Lastpage
    1647
  • Abstract
    A 256 K DRAM has been used to study the lateral transport of charge (electron-hole pairs) induced by direct ionization from heavy-ion tracks in an IC. The qualitative charge transport has been simulated using a 2-D numerical code in cylindrical coordinates. The experimental bit-map data clearly show the manifestation of lateral charge transport in the creation of adjacent multiple-bit errors from a single heavy-ion track. The heavy-ion data further demonstrate the occurrence of multiple-bit errors from single ion tracks with sufficient stopping power. The qualitative numerical simulation results suggest that electric-field-funnel-aided (drift) collection accounts for single error generated by an ion passing through a charge-collecting junction, while multiple errors from a single ion track are due to lateral diffusion of ion-generated charge. A quantitative analysis of this effect would require that the simulation be extended to adjacent devices and would therefore require a 3-D numerical code in Cartesian coordinates
  • Keywords
    integrated memory circuits; ion beam effects; monolithic integrated circuits; random-access storage; 2-D numerical code; 256 kbit; Cartesian coordinates; DRAM; adjacent multiple-bit errors; bit-map data; charge-collecting junction; cylindrical coordinates; direct ionization; electric-field-funnel-aided; electron-hole pairs; heavy-ion tracks; integrated circuit chips; ion-generated charge; lateral transport; multiple errors; stopping power; Charge measurement; Computational modeling; Current measurement; DRAM chips; Integrated circuit technology; Ion implantation; Laboratories; MOS capacitors; Propulsion; Random access memory;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.25513
  • Filename
    25513