DocumentCode :
1001663
Title :
Optimization of silicon bipolar transistors for high current gain at low temperatures
Author :
Woo, Jason C S ; Plummer, James D.
Author_Institution :
Integrated Circuits Lab., Stanford Univ., CA, USA
Volume :
35
Issue :
8
fYear :
1988
fDate :
8/1/1988 12:00:00 AM
Firstpage :
1311
Lastpage :
1321
Abstract :
Bipolar transistors designed specifically for operation at liquid-nitrogen (LN2) temperature are discussed. It is found that for high-gain LN2 bipolar transistors, the emitter concentration should be around 5×1018 cm-3. Compensating impurities in the base should be kept to minimum. Test bipolar transistors with polysilicon emitter contacts were fabricated using these criteria. The devices show very little current degradation between room temperature and 77 k. Polysilicon emitter contacts are also shown to be somewhat more effective at lower temperatures
Keywords :
bipolar transistors; elemental semiconductors; semiconductor device models; semiconductor technology; silicon; 77 to 300 K; Si bipolar transistors; current degradation; current gain; emitter concentration; high gain bipolar transistors; low temperatures; models; operation; polycrystalline Si emitters; room temperature; Bipolar transistors; CMOS technology; Degradation; Delay; Impurities; Integrated circuit interconnections; Photonic band gap; Silicon; Temperature; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.2553
Filename :
2553
Link To Document :
بازگشت