Title :
Patterning effect on easy axis alignment in permalloy thin film
Author :
Shiroishi, Y. ; Shiiki, K. ; Yuitoo, I. ; Tanabe, H. ; Fujiwara, H. ; Kudo, M.
Author_Institution :
Hitachi, Ltd., Kokubunji, Tokyo, Japan
fDate :
5/1/1984 12:00:00 AM
Abstract :
An investigation has been made of the domain configuration in photofabricated Permalloy patterns. In some cases the direction of the easy axis is found to be rotated perpendicular to that initially induced. This change can be explained in terms of uniaxial tension simulated by a two-dimensional finite-element method.
Keywords :
Permalloy films/devices; Glass; Laboratories; Magnetic anisotropy; Magnetic films; Perpendicular magnetic anisotropy; Residual stresses; Substrates; Thermal stresses; Thin film devices; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1984.1063116
