Title :
Low-threshold continuous-wave 1.5-μm GaInNAsSb lasers grown on GaAs
Author :
Bank, Seth R. ; Wistey, Mark A. ; Goddard, Lynford L. ; Yuen, Homan B. ; Lordi, Vincenzo ; Harris, James S., Jr.
Author_Institution :
Solid State & Photonics Lab., Stanford Univ., CA, USA
fDate :
6/1/2004 12:00:00 AM
Abstract :
We present the first continuous-wave (CW) edge-emitting lasers at 1.5 μm grown on GaAs by molecular beam epitaxy (MBE). These single quantum well (QW) devices show dramatic improvement in all areas of device performance as compared to previous reports. CW output powers as high as 140 mW (both facets) were obtained from 20 μm × 2450 μm ridge-waveguide lasers possessing a threshold current density of 1.06 kA/cm2, external quantum efficiency of 31%, and characteristic temperature T0 of 139 K from 10°C-60°C. The lasing wavelength shifted 0.58 nm/K, resulting in CW laser action at 1.52 μm at 70°C. This is the first report of CW GaAs-based laser operation beyond 1.5 μm. Evidence of Auger recombination and intervalence band absorption was found over the range of operation and prevented CW operation above 70°C. Maximum CW output power was limited by insufficient thermal heatsinking; however, devices with a highly reflective (HR) coating applied to one facet produced 707 mW of pulsed output power limited by the laser driver. Similar CW output powers are expected with more sophisticated packaging and further optimization of the gain region. It is expected that such lasers will find application in next-generation optical networks as pump lasers for Raman amplifiers or doped fiber amplifiers, and could displace InP-based lasers for applications from 1.2 to 1.6 μm.
Keywords :
Auger effect; III-V semiconductors; electron-hole recombination; gallium arsenide; gallium compounds; indium compounds; laser cavity resonators; molecular beam epitaxial growth; optical communication equipment; quantum well lasers; surface emitting lasers; waveguide lasers; 1.2 to 1.6 mum; 1.5 mum; 1.52 mum; 10 to 60 degC; 139 K; 140 mW; 20 mum; 2450 mum; 31 percent; 70 degC; 707 mW; Auger recombination; GaAs; GaInNAsSb; GaInNAsSb lasers; InP-based lasers; Raman amplifiers; continuous-wave lasers; doped fiber amplifiers; edge-emitting lasers; highly reflective coating; intervalence band absorption; low-threshold lasers; molecular beam epitaxy; optical networks; pump lasers; ridge-waveguide lasers; single quantum well devices; thermal heatsinking; threshold current density; Doped fiber amplifiers; Fiber lasers; Gallium arsenide; Molecular beam epitaxial growth; Power amplifiers; Power generation; Power lasers; Pulse amplifiers; Pump lasers; Quantum well lasers; 1.5 $muhbox m$; 1.55 $muhbox m$; Auger recombination; CW; GaInNAs; GaInNAsSb; GaNAs; InGaAsN; continuous wave; gallium arsenide; intervalence band absorption; molecular beam epitaxy; optical communications; semiconductor laser;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.2004.828249