DocumentCode :
1003071
Title :
Simulation of quantum transport in monolithic ICs based on In0.53Ga0.47As-In0.52Al0.48As RTDs and HEMTs with a quantum hydrodynamic transport model
Author :
Höntschel, Jan ; Stenzel, Roland ; Klix, Wilfried
Author_Institution :
Dept. of Electr. Eng., Univ. of Appl. Sci. Dresden, Germany
Volume :
51
Issue :
5
fYear :
2004
fDate :
5/1/2004 12:00:00 AM
Firstpage :
684
Lastpage :
692
Abstract :
A new quantum hydrodynamic transport model based on a quantum fluid model is used for numerical calculations of different quantum sized devices. The simulation of monolithic integrated circuits of resonant tunneling structures and high electron mobility transistors (HEMT) based on In053Ga0.47As-In052Al0.48As-InP is demonstrated. With the new model, it is possible to describe quantum mechanical transport phenomena like resonant tunneling of carriers through potential barriers and particle accumulation in quantum wells. Different structure variations, especially the resonant tunneling diode area and the gate width of the HEMT structure, show variable modulations in the output characteristics of the monolithic integrated device.
Keywords :
circuit simulation; high electron mobility transistors; monolithic integrated circuits; quantum fluids; resonant tunnelling diodes; semiconductor device models; HEMT; In0.53Ga0.47As-In0.52Al0.48As-InP; RTD; device simulation; gate width; high electron mobility transistors; integrated circuits; monolithic IC; numerical calculations; particle accumulation; potential barriers; quantum fluid model; quantum hydrodynamic transport model; quantum mechanical transport; quantum transport; quantum wells; resonant tunneling devices; resonant tunneling diode area; resonant tunneling structures; Circuits; HEMTs; Hydrodynamics; MODFETs; Poisson equations; Quantum mechanics; Resonant tunneling devices; Schrodinger equation; Semiconductor devices; Semiconductor diodes; Device simulation; HEMTs; high electron mobility transistors; quantum hydrodynamic; quantum transport; resonant tunneling devices;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2004.825815
Filename :
1303825
Link To Document :
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